Quanxin Semiconductor Technology (Wuxi) Co., Ltd

Functional Features
◆The structure is rationally designed and the technology is mature.
◆It has low vibration, high reliability, and high production capacity.
◆It is easy to operate and convenient to maintain. The whole machine runs stably and reliably.
Technical Parameters
◆The wafer size is suitable for 2 - 12 - inch production lines.
◆The wafer breakage rate is one in ten thousand.
Application Fields
◆Spin - drying of wafers in various process technologies such as SPM acid cleaning, organic cleaning, development, photoresist stripping, ITO etching, BOE etching, and photoresist coating.
Equipment Functions
◆The equipment is available in 2 - station and 4 - station models. It can be used for the wet - process spin - drying of 2 - 12 - inch silicon wafers, potassium nitride, gallium arsenide, sapphire, semiconductors, LEDs, solar cells, etc., realizing functions including cleaning, spin - drying, nitrogen drying, and drying of the working chamber.

Functional Features

◆ It is intelligently controlled by PLC, making all operations reliable and the programs intelligent.

◆ Adopting a unique transmission structure design to ensure that the equipment has low vibration and high stability when running at high speed.

◆ The rotating shaft is sealed with nitrogen and designed in a labyrinth pattern, ensuring that the chamber is isolated from the external environment during the operation of the equipment.

◆ The spin-drying barrel features a spiral design, which facilitates smooth drainage and ventilation and reduces secondary backflow.

◆ The door cover uses clean air filtered by a high-efficiency FFU (Fan Filter Unit) and a primary-effect filter for high-speed centrifugal spin-drying, which is efficient, energy-saving, and environmentally friendly.

◆ The main components are made of high-quality stainless steel SUS316L. The frame is integrally welded with high-strength steel plates and processed with a powder spraying technique.

◆ It has a novel appearance design and a user-friendly design, making it convenient and easy to operate.

◆ The rotating mechanism has undergone precise dynamic balance calibration, and the main frame adopts a load-bearing structure to ensure balance and stability during the operation of the system.

◆ A single machine can switch among up to 3 sizes for operation, boasting strong compatibility.

◆ When used in combination with an automatic cleaning machine, it saves space, is highly efficient, and reduces labor costs.

◆ It can provide two connection modes: dry contacts and communication.

◆ The process is mature, the performance is stable, and the vibration is low (with vibration protection).

◆ It has a special dust-proof design.

◆ It can be used independently or connected to other equipment.

◆ The wafer rack faces upward, which is convenient for robotic arms or manual material picking, especially for large-sized wafers.